Accession Number : ADA270852


Title :   Focused-Ion-Beam Material Removal Rates


Descriptive Note : Summary rept.,


Corporate Author : ARMY RESEARCH LAB ADELPHI MD


Personal Author(s) : Geil, Bruce


Full Text : http://www.dtic.mil/get-tr-doc/pdf?AD=ADA270852


Report Date : SEP 1993


Pagination or Media Count : 19


Abstract : Focused-ion-beam milling is a tool used in failure analysis and production of integrated circuits. This technique uses a focused gallium beam to mill away materials on a surface. Each material mills at a different rate, which must be experimentally determined. The data presented here for several materials used in standard integrated circuit processes will allow the user to determine the dose level needed to mill a certain amount of a given material.


Descriptors :   *REMOVAL , *MATERIALS , *RATES , *ION BEAMS , *INTEGRATED CIRCUITS , *MILLING MACHINES , ELECTRONICS , SURFACES , STANDARDS , GALLIUM , SILICON CARBIDES , TITANATES , BARIUM , GOLD , CIRCUITS , ARSENIDES , ALUMINUM , PRODUCTION , FAILURE , COMPOSITE MATERIALS , TOOLS , IONS


Subject Categories : ELECTRICAL AND ELECTRONIC EQUIPMENT
      MACHINERY AND TOOLS
      PARTICLE ACCELERATORS


Distribution Statement : APPROVED FOR PUBLIC RELEASE