Accession Number : AD1014783


Title :   Hybrid Physical Vapor Deposition Instrument for Advanced Functional Multilayers and Materials


Descriptive Note : Technical Report,01 Aug 2014,31 Jul 2015


Corporate Author : North Carolina State University Raleigh, United States


Personal Author(s) : Maria,Jon-Paul


Full Text : http://www.dtic.mil/dtic/tr/fulltext/u2/1014783.pdf


Report Date : 27 Apr 2016


Pagination or Media Count : 11


Abstract : PI Maria received support to construct a physical vapor deposition (PVD) system that combines electron beam (ebeam) evaporation, magnetron sputtering, pulsed laser ablation, and ion-assisted deposition. The instrumentation enables clean, uniform, and rapid deposition of a wide variety of metallic, semiconducting, and ceramic thin films with microstructures and composite geometries enhanced by energetic bombardment during growth.


Descriptors :   PHYSICAL VAPOR DEPOSITION , SPUTTERING , pulsed lasers , ELECTRON BEAMS , magnetrons , ablation , ions , thin films , MICROSTRUCTURE , layers


Distribution Statement : APPROVED FOR PUBLIC RELEASE